SEARCH PRODUCTS

TITANIUM ETCHANTS
Selective and controllable etchants for application in semiconductor fabrication and thin film microelectronics technology.

Titanium Etchant TFT

Designed for etching evaporated films commonly employed as bonding and barrier layers in microelectronics. Excellent resolution, photo resist compatibility, and minimal undercutting are readily achieved.

Titanium Etchant TFTN

Intended for etching Ti films deposited on glass or SiO2 substrates. TFTN does not contain hydrofluoric acid.

PROPERTIES:

 

TFT

TFTN

Appearance

Clear Aqueous Solution

Clear Aqueous Solution

pH

1

1

Flash Point

Non-Flammable

Non-Flammable

Storage

Room Temperature

Room-Temperature

Shelf/Life

1 year

1 year

Toxicity

Strong Acid

Strong Acid


OPERATION:

 

TFT

TFTN

Tank

Polyethylene

Polyethylene or Quartz

Temperature

20°-50°C

70°-85°C

Etch Rate

25Å/sec @ 20°C
50Å/sec @ 30°C

10Å/sec @ 70°C
50Å/sec @ 85°C
Etch Rate, Thermal Oxide 7Å/sec @ 20°C  

Rinse Water

Water

Water

* Compatible Resists

Pos & Neg.

Pos & Neg.

Metallization

 

Most Metals Except Al

* KPR/KMER/KTFR: PKP (Transene); AZ/RISTON/ETC.