Transene - Etchants - Titanium Etchant

TITANIUM ETCHANTS
Selective and controllable etchants for application in semiconductor fabrication and thin film microelectronics technology.

Titanium Etchant TFT

Designed for etching evaporated films commonly employed as bonding and barrier layers in microelectronics. Excellent resolution, photo resist compatibility, and minimal undercutting are readily achieved.

Titanium Etchant TFTN

Intended for etching Ti films deposited on glass or SiO₂ substrates. TFTN does not contain hydrofluoric acid.

PROPERTIES:

	TFT	TFTN
Appearance	Clear Aqueous Solution	Clear Aqueous Solution
pH	1	1
Flash Point	Non-Flammable	Non-Flammable
Storage	Room Temperature	Room-Temperature
Shelf/Life	1 year	1 year
Toxicity	Strong Acid	Strong Acid

OPERATION:

	TFT	TFTN
Tank	Polyethylene	Polyethylene or Quartz
Temperature	20°-50°C	70°-85°C
Etch Rate	25Å/sec @ 20°C 50Å/sec @ 30°C	10Å/sec @ 70°C 50Å/sec @ 85°C
Rinse Water	Water	Water
* Compatible Resists	Pos & Neg.	Pos & Neg.
Metallization		Most Metals Except Al

* KPR/KMER/KTFR: PKP (Transene); AZ/RISTON/ETC.