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<Nichrome Etchants TFN Nichrome Etchant TFN is designed for etching nichrome thin films in microelectronics applications. Nichrome Etchant TFN is compatible with positive and negative photoresists and provide sfine-line control with minimal undercutting. This high purity formulations filtered to 0.2 micron is well suited to critical microelectronic applications. NICHROME ETHCANT TFNMinimal undercutting with excellent fine-line control. Consistent operation. FEATURES:
DESCRIPTION: Transene Nichrome Etchantd TFN is a high purity system based on ceric ammonium nitrate. Nichrome Etchant TFN provides clean, precise etching of evaporated nichrome layers for the preparation of thin film circuits. High precision photomask etching is also accomplished using Nichrome Etchant TFN. Nichrome Etchant TFN contains semiconductor grade ingredients for ultra-high purity and is filtered to 0.2 microns to remove particulates. PROPERTIES:
APPLICATION: Nichrome Etchant TFN may be operated at room temperature or elevated temperature to increase etch rates. Rinsing with deionized water is suitable. Nichrome Etchant TFN is an improved formulation which etches more cleanly, eliminating the need for an intermediate rinse. |
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