NEGATIVE PHOTORESIST CHEMICALS DESCRIPTION: Negative photoresist chemicals are available for all phases of photolithographic operation. High purity solvents and solvent blends are filtered to 0.1 µ absolute and are supplied with a certificate of analysis.    ·  NPR 4040 - Negative Photoresist Rinse is an effective rinse for unexposed negative photoresist.    ·  PKP II Thinner is a thinning solvent for PKP Type II photoresist.    ·  PKP II Rinse is specifically formulated for use with PKP Type II photoresist.    ·  Stoddard Solvent is specifically formulated for use with PKP Type II photoresist.