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 Moly Etchant - TFM Tungsten Etchant - TFW Selective etchants for molybdenum and tungsten thin-film metallizations used in semiconductor and microelectronics technology. TFM and TFW selective etchants are buffered, mildly alkaline ferricyanide-based formulations providing high resolution patterns with minimal undercutting and photoresist compatibility. Controlled, uniform etching is achieved by immersion or spray etch technique. PROPERTIES
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