Fluorinated Tin Oxide Etchant
FTO 100-FBA5
DESCRIPTION:
Fluorinated Tin Oxide Etchant FTO 100-FBA5 is a selective etchant for fluorinated tin oxide films. FTO 100-FBA5 effectively etches FTO, ITO, and tin oxide films deposited on photovoltaics, opto-electronic devices, ceramics, dielectrics, semiconductors, and many metals. FTO 100-FBA5 provides a high degree of etch rate control. Broad compatibility with positive and negative photoresists is offered. Incompatible materials include nickel, copper, nichrome, and aluminum.
| Appearance |
Dark amber |
| Etch Rate @ 40 °C |
40 Å / sec |
| Operating Temperature |
40-50 °C |
| Rinse |
Deionized Water |
| Storage |
Ambient |
| Shelf Life |
1 year |
APPLICATION:
FTO films are deposited in a variety of ways including co-deposition from plasma, plasma doping, and sol-gel techniques. FTO 100-FBA5 offers improved solubility of fluorinated tin oxide films over standard ITO etchants. Slightly elevated temperatures are recommended for optimal etch control. Strong agitation or stirring is recommended.
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