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Semiconductor and Thin Film Etchants for Microelectronic Circuits
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THIN FILM TRANSENE ETCHANTS OPERATING RANGE RECOMMENDED RESIST APPLICATION
Al ALUMINUM ETCHANTS

TYPE A


TYPE D


TYPE F
@25 C @ 40 C

30 /sec 80 /sec


40 /sec 125 /sec


30 /sec 80 /sec


Negative

&

Positive


Semiconductor & Integrated Circuits

GaAs & GaP Devices

AlSi Materials
Al2O3 TRANSETCH N 120 /min @ 180 C SiO2 Semiconductor Devices
BOE BUFFERED OXIDE ETCHANT Variable Negative Semiconductor & Integrated Circuits
Cr CHROMIUM ETCHANTS
     1020
     1020AC
@ 40 C
40 /sec
32 /sec
Negative
&
Positive
Thin Film Circuits
Chrome Mask
Cr-Si
Cr-SiO
CHROMIUM CERMET
     TFE
1000 /min @ 50 C Negative Thin Film Circuits
Cu COPPER ETCHANTS

CE-100

CE-200

APS-100

Copper Etch 49-1

Copper Etch BTP


1 mil/min @ 40 C

0.5 mil/min @ 40 C

80 /sec @ 40 C

22 /sec @ 30 C

150 /sec @ 30 C


Screen Resists

Positive & Negative




Negative


P.C.Boards

Thin Film Circuits



Ni Compatability

Ni Compatability
GaAs GALLIUM ARSENIDE

     GA ETCH 100
     GA ETCH 200
     GA ETCH 300
     AB ETCH


100 /sec @ 40 C
20 /sec @ 5 C
22 /sec @ 25 C
Defect Delineation
Negative Microelectronic Circuits



Semiconductor Testing
GaN GALLIUM NITRIDE

80 A/min SiO2 LED
Ga2O3 GALLIUM OXIDE 10 /sec @ 25 C Negative Microelectronic Circuits
GaP GALLIUM PHOSPHIDE A Face(Ga):
115 micron/hr @ 80 C
B Face (P):
210 micron/hr @ 80 C
Negative Light Emitting Diodes
Ge GERMANIUM 250 /sec @ 20 C
Negative


Semiconductor Devices
Au GOLD ETCHANTS
     TFA
     TFAC
     GE-8148
     GE-8110
     GE-8111

28 /sec @ 25 C
30 /sec @ 60 C
50 /sec @ 25 C
15 /sec @ 25 C
15 /sec @ 25 C

Neg & Pos
Negative
Neg & Pos
Neg & Pos
Neg & Pos

Thin Film Circuits
GaAs compatible
Ni compatible
Ni compatible
Ni compatible
Hf, HfO HAFNIUM, HAFNIUM OXIDE 45 /sec @ 25 C
ALD HfO 7.5 /sec
Negative Use Titanium Etch TFT
In2O3
ITO
INDIUM OXIDE
INDIUM TIN OXIDE
15 /sec @ 25 C Negative Microelectronic Circuits
InP INDIUM PHOSPHIDE 30 mins @ 25 C Negative Microelectronic Circuits
Fe2O3 IRON OXIDE MASK
ETCHANT
     ME-10
     ME-30


50 /sec @ 25 C
25 /sec @ 25 C
Negative

&

Positive
Microelectronic Circuits
Polyimide KAPTON POLYIMIDE
ETCHANT
0.013 mil/min @ 40 C
0.07 mil/min @ 60 C
Negative Polyimide/Copper Clad Laminates
MgO Magnesium Oxide Etchant MgOX12 40 /sec @ 30C Negative &
Positive
Mo MOLY ETCHANT TFM 55 /sec @ 30 C

85 /sec @ 60 C
Negative Microelectronic Circuits
Nb
NbN
NbO
Niobium
Niobium Nitride
Niobium Oxide
50 / sec @ 25 oC Negative
Microelectronics
Ni-Cr NICHROME ETCHANTS
     TFN

50 /sec @ 40 C
Negative & Positive Thin Film Circuits
Ni NICKEL ETCHANTS
     TFB
     TFG
     Type I

30 /sec @ 25 C
50 /sec @ 40 C
3 mil/hr @ 40 C
Negative & Positive Thin Film Circuits
Ni-V Nickel-Vanadium Etch
30 /sec @ 20 C Negative&Positive Microelectronics
Pd PALLADIUM ETCHANTS
     TFP
110 /sec @ 50 C Negative & Positive Semiconductor & Thin Film Circuits
Pd PALLADIUM ETCHANT
     EC
    Electrochemical Etching
  REAGENT SEMICONDUCTOR ETCHANTS (RSE)
Ru RUTHENIUM ETCH
20 /sec @ 20 C Negative&Positive Microelectronics
  SEMICONDUCTOR DEFECT DELINEATION ETCHANTS
Si REAGENT SEMICONDUCTOR ETCHANTS (RSE)

SILICON SLOW ETCH

SILICON MESA ETCH

PREFERENTIAL SILICON ETCHANTS
     PSE 200
     PSE 300

SOLAR CELL ETCHANTS
     SCE-200
     SCE-300

WRIGHT ETCHANT

WRIGHT-JENKINS ETCHANT

SIRTL ETCHANT
Variable



Variable

Variable



1 mil/3 min @ 100 C
25 m/hr @ 100 C


1 hr @ 75-100 C
5-10 min @ 118 C

Defect Characterization

Defect Characterization


Defect Characterization




KMER

PKP Type I



<110>
<100>
<110>

<100>


N/A

N/A


N/A
Semiconductor
Devices


Semiconductor
Devices


MEMS

Semiconductors



Solar Cells


Semiconductor Testing
Semiconductor Testing

Semiconductor Testing
SiC SILICON CARBIDE 80 /min Negative LED
SiO2 BUFFER HF IMPROVED

BD ETCHANT

TIMETCH

SILOX VAPOX III

AIPAD Etch 639

BUFFERED OXIDE ETCHANTS (BOE)
800/min @ 25 C
Thermally Grown
Variable

90 /min @ 25 C

4000 /min @ 22 C

5000 /min

Variable
Negative Semiconductor & Integrated Circuits
PSG/BSG

CVD

CVD, Al Compatible

Al Compatible
SiO SILICON MONOXIDE ETCH
5000 /min @ 85 C Negative Semiconductor Devices
Si3N4 TRANSETCH N 125 /min @ 180 C SiO2 (Silox) Semiconductor & Integrated Circuits
Ag SILVER ETCHANT TFS 200 /sec @ 25 C Negative & Positive Semiconductor & Thin Film Circuits
Stainless Steel Nickel Etch Type I 45 /sec @ 25 C, AISI 316 Negative & Positive Alloys
Ta
Ta3N5
Ta2O5
SIE-8607
Ta Etch 111
70 /sec @ 25 C
30 /sec @ 25 C
Negative & Positive Capacitors
Semiconductors
TaSi Tantalum Silicide Etch
50 /sec @ 20 C Negative&Positive Thin Film Electronics
Sn, SnO Tin, Tin Oxide 15 /sec @ 25 C Negative Microelectronic Circuits
Ti TITANIUM ETCHANTS
     TFT

     TFTN

25 /sec @ 20 C
50 /sec @ 30 C
10 /sec @ 70 C
50 /sec @ 85 C
Negative


Positive
Integrated Circuits


SiO2 Compatible
TiN Titanium Nitride Etch
30 /sec @ 20 C Negative Microelectronics
Ti-W TI-TUNGSTEN ETCHANT TiW-30 20-30 /sec Negative & Positive Thin Film Circuits
Adhesion Layer
W TUNGSTEN ETCH TFW 140 /sec @ 30 C Negative Integrated Circuits
SnO NESA ETCHANT
TE-100
0.02 micron/min @ 20 C Screen Resists Electronic Circuits
  ELECTRONIC GRADE CHEMICALS (SOLVENTS, ACIDS)