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Electronic Grade Chemicals

High purity chemicals, low sodium, required for high yield processing of semiconductors.

Ammonium Fluoride 40%

Assay (NH4F)

40.0% ± 1%

pH

7.75 ± 0.25

Residue after ignition(max)

10 PPM

Impurity

Max. PPM

Chlorides (Cl)

4.0

Sulfates (as SO4)

2.0

Heavy Metals (as Pb)

1.0

Iron (Fe)

1.0

Phosphorus (as PO4)

1.0

Sodium (Na)

1.0

Arsenic (As)

0.5

Copper (Cu)

0.5

Nickel (Ni)

0.5


Hydrofluoric Acid 49%

Assay (HF)

49% ± 0.25%

Sp. GR. @ 60 °F

1.18 ± 0.005

Residue after ignition(max)

5 PPM

Fluosilicic Acid (H2SiF6)

100 PPM

Impurity

Max. PPM

Chlorides (Cl)

5.0

Sulfates (as SO4)

2.0

Phosphorus (as PO4)

1.0

Heavy Metals (as Pb)

0.5

Iron (Fe)

0.5

Sodium (Na)

0.5

Copper (Cu)

0.1

Lead (Pb)

0.1

Nickel (Ni)

0.1

Arsenic (As)

0.05


Nitric Acid 70%

Assay ( HNO3)

70% ± 1%

Sp. Gr. @ 60 °F

1.420 ± 0.004

Residue after ignition(max)

4 PPM

Impurity

Max. PPM

Chlorides (Cl)

0.1

Sulfates (as SO4)

1.0

Heavy Metals (as Pb)

0.1

Arsenic (As)

0.005

Iron (Fe)

0.2

Copper (Cu)

0.05

Nickel (Ni)

0.05

Chromium (Cr)

0.1


Acetic Acid Glacial

Assay (CH3COOH)

99.7% minimum

Residue after evaporation(max)

10 PPM

Impurity

Max. PPM

Chlorides (Cl)

1.0

Sulfates (as SO4)

1.0

Heavy Metals (as Pb)

0.5

Iron (Fe)

0.2

Copper (Cu)

0.1

Nickel (Ni)

0.1