 |
|||||||||||
|
 |
Etchants for chromium thin films for microelectronics applications offer excellent compatibility with positive and negative photoresists. Chromium Etchants provide fine-line control with minimal undercutting. High purity formulations filtered to 0.2 micron are ideal for critical devices. CHROMIUM ETCHANT 1020 Fast etch rate with minimal undercutting CHROMIUM ETCHANT 1020AC Slower etch rate to eliminate undercutting and for broader compatibility CHROMIUM MASK ETCHANT Ideal for high precision photomask etching. CHROMIUM CERMET ETCHANT TFE For chromium-silicon films. Compatible with copper, nickel, and gold. FEATURES:
Chromium Etchants 1020 and 1020AC DESCRIPTION: Transene Chromium Etchants 1020 and 1020AC are high purity ceric ammonium nitrate systems for precise, clean etching of chromium and chromium oxide films. Chromium Etchant 1020AC is nitric-acid free and exhibits a slower etch rate. Both etchants are compatible with positive and negative photoresists. Chromium Etchant 1020 is filtered to remove all particulates above 0.2 microns. Minimal undercutting is achieved with Chromium Etchant 1020AC. PROPERTIES:
APPLICATION: Chromium Cermet Etchant TFE is a ready-to-use solution specifically designed to remove films of Cr, Cr-O, Cr-Si, and Cr-Si-O from metal substrates such as copper, gold, and nickel. Heating the etchant to 40-60 oC will speed the etch rate for thicker films. Continuous stirring is recommended during etching.
DESCRIPTION: Transene Chromium Mask Etchant is a product designed for the critical etch process in the new technique for making chrome metal photomasks. Chrome masks are economical to produce and, as used in microelectronics, give much better service than emulsion type photomasks. Chromium Mask Etchant permits precise etching of chromium. It is relatively non-toxic and non-hazardous to use, replacing conventional dangerous laboratory etchants in the mask making process. The etchant is room-temperature operated, offers excellent visual etch control and is compatible with both positive and negative photoresist materials. Fine line definition and geometrics are registered and held to tolerances in the sub-micron range. Transene Chromium Mask Etchant is used successfully on all Kodak chromium-clad plates or chromium-on-glass plates in general. Properties of Chromium Mask Etchants
APPLICATIONS Recommended photoresist materials, highly compatible with Chromium Mask Etchant, including all positive and negative photoresists. These afford reproductions of micro-images in chromium. The etchant can be used directly on Kodak MetalClad Plate P which incorporates a positive-working photosensitive resist coating on chromium-coating glass. Operating procedures should be followed as described in the instructions. In general the etch process involves the following operations:
The thickness of chromium clad on plates is on the order of 800 Å. The etching time is therefore on the order of 60 seconds.
Chromium Etchant CRE-473 is a selective chromium etchant for plated hard chromium in microelectronics applications. CRE-473 effectively etches plated chromium films deposited on copper, nickel, gold, or molybdenum. Good compatibility with positive and negative photoresists is obtained. CRE-473 is not an effective etchant for sputtered, evaporated, or bulk chromium. Properties
APPLICATIONS: Chromium Etchant CRE-473 is a ready-to-use solution specifically designed to remove electroplated chromium films from metal substrates such as copper, gold, nickel, and molybdenum. Heating the etchant to 40 °C will speed the etch rate for thicker films.
|
|||||||||
 |
|||||||||||
 |
 |
||||||||||
